Semiconductor device and operating method thereof

ABSTRACT

A semiconductor memory device includes a cell string, a common source line controller, and a page buffer. The cell string includes a plurality of memory cells coupled in series between a common source line and a bit line. In a read operation, the common source line controller provides a channel current to the cell string through the common source line. The page buffer senses data stored in a selected memory cell among the plurality of memory cells by sensing a current of the bit line when the channel current is provided. The common source line controller precharges the bit line by providing the channel current to the cell string through the common source line. After the bit line is precharged, the page buffer senses the data stored in the selected memory cell by transmitting a voltage of the bit line to a sensing node.

CROSS-REFERENCE TO RELATED APPLICATION

The present application claims priority under 35 U.S.C. § 119(a) toKorean patent application number 10-2017-0095723 filed on Jul. 27, 2017,which is incorporated herein by reference in its entirety.

BACKGROUND Field of Invention

An aspect of the present disclosure relates to an electronic device.Particularly, the present disclosure relates to a semiconductor deviceand an operating method thereof.

Description of Related Art

Semiconductor devices may be formed in a two-dimensional structure inwhich strings are arranged horizontally to a semiconductor substrate, orbe formed in a three-dimensional structure in which strings are arrangedvertically to a semiconductor substrate. A three-dimensionalsemiconductor device is devised to overcome the limit of degree ofintegration in two-dimensional semiconductor devices, and may include aplurality of memory cells vertically stacked on a semiconductorsubstrate.

SUMMARY

Embodiments provide a semiconductor device having improved reliabilityof a read operation.

Embodiments also provide a read method of a semiconductor device havingimproved reliability.

According to an aspect of the present disclosure, there is provided asemiconductor device including: a cell string including a plurality ofmemory cells coupled in series between a common source line and a bitline; a common source line controller configured to provide a channelcurrent to the cell string through the common source line in a readoperation; and a page buffer configured to sense data stored in aselected memory cell among the plurality of memory cells based on acurrent of the bit line when the channel current is provided, whereinthe common source line controller precharges the bit line with thechannel current supplied to the cell string through the common sourceline, wherein, after the bit line is precharged, the page buffer sensesthe data stored in the selected memory cell based on a voltage of thebit line transmitted to a sensing node.

The page buffer may include: a bit line sensing transistor coupledbetween the bit line and a common node; an emission transistor coupledbetween the common node and a first power source; a transmissiontransistor coupled between the common node and the sensing node; and apower supply transistor coupled between the sensing node and a secondpower source. While the bit line is being precharged, the transmissiontransistor and the power supply transistor may be turned on in a firstturn-on state, the bit line sensing transistor may be turned on in asecond turn-on state, and the emission transistor may be turned off.

The page buffer may further include: a sensing transistor having a gateelectrode coupled to the sensing node; a strobe transistor coupledbetween a first electrode of the sensing transistor and a third powersource; and a latch circuit coupled to a second electrode of the sensingtransistor.

According to an aspect of the present disclosure, there is provided amethod for operating a semiconductor device, the method including:precharging a bit line according to a program state of a selected memorycell of a cell string by providing a channel voltage to a common sourceline; transmitting a voltage of the precharged bit line to a sensingnode coupled to a gate electrode of a sensing transistor; and storingdata of the selected memory cell in a latch circuit, based on thevoltage transmitted to the sensing node.

The precharging of the bit line may include: applying a channel voltagehaving a positive voltage value to the common source line of the cellstring; and turning on a drain select transistor and a source selecttransistor of the cell string in a first turn-on state.

According to an aspect of the present disclosure, there is provided amethod for operating a semiconductor device, the method including:providing a channel voltage to a common source line; transmitting avoltage of a bit line according to a program state of a selected memorycell of a cell string to a sensing node coupled to a gate electrode of asensing transistor, based on the provided channel voltage; and storingdata of the selected memory cell in a latch circuit, based on thevoltage transmitted to the sensing node.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a block diagram illustrating a semiconductor device accordingto an embodiment of the present disclosure.

FIG. 2 is a block diagram illustrating an embodiment of a memory cellarray of FIG. 1.

FIG. 3 is a circuit diagram illustrating an embodiment of one of memoryblocks of FIG. 2.

FIG. 4 is a circuit diagram illustrating another embodiment of the oneof the memory blocks of FIG. 2.

FIG. 5 is a block diagram illustrating any one of page buffers of FIG.1.

FIG. 6 is a timing diagram illustrating an embodiment of an operation ofthe page buffer shown in FIG. 5 in a read operation.

FIG. 7 is a diagram illustrating a precharge operation of the pagebuffer according to the embodiment of FIG. 6 when a selected memory cellis in an erase state.

FIG. 8 is a diagram illustrating a sensing operation of the page bufferaccording to the embodiment of FIG. 6 when the selected memory cell isin the erase state.

FIG. 9 is a diagram illustrating an operation of the page bufferaccording to the embodiment of FIG. 6 when the selected memory cell isin a program state.

FIG. 10 is a timing diagram illustrating another embodiment of theoperation of the page buffer shown in FIG. 5 in the read operation.

FIG. 11 is a diagram illustrating a read operation of the page bufferaccording to the embodiment of FIG. 10 when the selected memory cell isin the erase state.

FIG. 12 is a flowchart illustrating an operating method of thesemiconductor device according to an embodiment of the presentdisclosure.

FIG. 13 is a flowchart illustrating an embodiment of a step ofprecharging a bit line, which is shown in FIG. 12.

FIG. 14 is a flowchart illustrating an embodiment of a step oftransmitting a voltage of the bit line to a sensing node, which is shownin FIG. 12.

FIG. 15 is a flowchart illustrating an embodiment of a step of storingdata of a selected memory cell in a latch circuit, which is shown inFIG. 12.

FIG. 16 is a block diagram illustrating another embodiment of the memorycell array of FIG. 1.

FIG. 17 is a block diagram illustrating a memory system including thesemiconductor device of FIG. 1.

FIG. 18 is a block diagram illustrating an exemplary application of thememory system of FIG. 17.

FIG. 19 is a block diagram illustrating a computing system including thememory system described with reference to FIG. 18.

DETAILED DESCRIPTION

In the following detailed description, only certain exemplaryembodiments of the present disclosure have been shown and described,simply by way of illustration. As those skilled in the art wouldrealize, the described embodiments may be modified in various differentways, all without departing from the spirit or scope of the presentdisclosure. Accordingly, the drawings and description are to be regardedas illustrative in nature and not restrictive.

In the entire specification, when an element is referred to as being“connected” or “coupled” to another element, it can be directlyconnected or coupled to the another element or be indirectly connectedor coupled to the another element with one or more intervening elementsinterposed therebetween. In addition, when an element is referred to as“including” a component, this indicates that the element may furtherinclude another component instead of excluding another component unlessthere is different disclosure.

Hereinafter, exemplary embodiments of the present disclosure will bedescribed in detail with reference to the accompanying drawings. Thesame reference numerals are used to designate the same elements as thoseshown in other drawings. In the following descriptions, only portionsnecessary for understanding operations according to the exemplaryembodiments may be described, and descriptions of the other portions maybe omitted so as to not obscure important concepts of the embodiments.

In the figures, dimensions may be exaggerated for clarity ofillustration. It will be understood that when an element is referred toas being “between” two elements, it can be the only element between thetwo elements, or one or more intervening elements may also be present.Like reference numerals refer to like elements throughout.

Example embodiments will now be described more fully hereinafter withreference to the accompanying drawings; however, they may be embodied indifferent forms and should not be construed as limited to theembodiments set forth herein. Rather, these embodiments are provided sothat this disclosure will be thorough and complete, and will fullyconvey the scope of the example embodiments to those skilled in the art.

FIG. 1 is a block diagram illustrating a semiconductor device 100according to an embodiment of the present disclosure.

Referring to FIG. 1, the semiconductor device 100 includes a memory cellarray 110, an address decoder 120, a common source line controller 130,a voltage generator 140, a read/write circuit 150, a data buffer 160,and a control logic 170.

The memory cell array 110 is coupled to the address decoder 120 throughrow lines RL, and is coupled to the common source line controller 130through a common source line CSL. The memory cell array 110 is coupledto the read/write circuit 150 through bit lines BL1 to BLm.

The memory cell array 110 includes a plurality of memory blocks. Each ofthe plurality of memory blocks may include a plurality of cell strings.

In an embodiment, each of the plurality of cell strings may include aplurality of memory cells arranged or stacked above a substrate. Theplurality of memory cells may include volatile and/or nonvolatile memorycells. In an embodiment, each of the plurality of memory cells may bedefined as a single level cell or a multi-level cell. The memory cellarray 110 will be described in more detail with reference to FIGS. 2 to4.

The address decoder 120 is coupled to the memory cell array 110 throughthe row lines RL. The row lines RL include drain select lines, wordlines, and source select lines. In an embodiment, the row lines RL mayfurther include a pipe select line.

The address decoder 120 operates in response to the control of thecontrol logic 170. The address decoder 120 is configured to receive anaddress ADDR from the control logic 170 and drive the row lines RLaccording to the received address ADDR.

In an embodiment, the address ADDR includes a block address and a rowaddress in a read operation. The address decoder 120 is configured todecode the block address in the received address ADDR. The addressdecoder 120 selects one memory block according to the decoded blockaddress. The address decoder 120 is configured to decode the row addressin the received address ADDR. The address decoder 120, according to thedecoded row address, applies a read voltage provided from the voltagegenerator 140 to a selected word line of the selected memory block, andapplies a pass voltage provided from the voltage generator 140 tounselected word lines of the selected memory block.

The address decoder 120 may include a block decoder, a row decoder, anaddress buffer, and the like.

The common source line controller 130 is configured to control thecommon source line CSL in response to the control of the control logic170. The common source line controller 130 may provide a channel currentto the common source line CSL in various operations including a readoperation. As the channel current is provided, the common source lineCSL has a positive voltage.

The voltage generator 140 is configured to generate a plurality ofvoltages by using an external voltage supplied to the semiconductordevice 100. The voltage generator 140 operates in response to thecontrol of the control logic 170.

In an embodiment, the voltage generator 140 may include a circuit thatgenerates a power voltage by regulating an external voltage. In anembodiment, the voltage generator 140 may include a plurality of pumpingcapacitors, and generate a plurality of voltages by selectivelyactivating the plurality of pumping capacitors that receive a powervoltage. The generated voltages may be provided to the address decoder120, the common source line controller 130, the read/write circuit 150,the data buffer 160, and the control logic 170.

The read/write circuit 150 is coupled to the memory cell array 110through the bit lines BL1 to BLm. The read/write circuit 150 operates inresponse to the control of the control logic 170.

The read/write circuit 150 includes first to m-th page buffers PB1 toPBm respectively coupled to first to m-th bit lines BL1 to BLm. In aread operation, the first to m-th page buffers PB1 to PBm are configuredto read data of memory cells coupled to a selected word line(hereinafter, referred to as selected memory cells) by respectivelysensing currents of the first to m-th bit lines BL1 to BLm. Theread/write circuit 150 provides the read data DATA to the data buffer160 through data lines DL.

In an embodiment, the read/write circuit 150 may further include acolumn select circuit.

The data buffer 160 is coupled to the read/write circuit 150 through thedata lines DL. The data buffer 160 operates in response to the controlof the control logic 170. The data buffer 160 may output the data DATAprovided from the read/write circuit 150 to the outside.

The control logic 170 is coupled to the address decoder 120, the commonsource line controller 130, the voltage generator 140, the read/writecircuit 150, and the data buffer 160. The control logic 170 receives acommand CMD and an address ADDR from the outside. The control logic 170is configured to control the address decoder 120, the common source linecontroller 130, the voltage generator 140, the read/write circuit 150,and the data buffer 160 in response to the command CMD. The controllogic 170 provides the address ADDR to the address decoder 120.

In FIG. 1, it is illustrated that one page buffer is provided for eachbit line. However, this is illustrative, and the scope of the presentdisclosure is not limited thereto. In an embodiment, one page buffer maybe provided for every two bit lines, and a switching unit for connectingeither one of two bit lines with the page buffer may be provided. Forexample, a semiconductor device having an even-odd line structure may beprovided.

FIG. 2 is a block diagram illustrating an embodiment of the memory cellarray 110 of FIG. 1.

Referring to FIG. 2, the memory cell array 110 includes a plurality ofmemory blocks BLK1 to BLKz. Each memory block may have athree-dimensional structure. Each memory block includes a plurality ofmemory cells stacked above a substrate. The plurality of memory cellsare arranged along +X, +Y, and +Z directions. The structure of eachmemory block will be described in more detail with reference to FIGS. 3and 4.

FIG. 3 is a circuit diagram illustrating an embodiment of any one BLK1of the memory blocks BLK1 to BLKz of FIG. 2.

Referring to FIG. 3, a first memory block BLK1 includes a plurality ofcell strings CS11 to CS1 m and CS21 to CS2 m. In the first memory blockBLK1, m cell strings are arranged in a row direction (i.e., a +Xdirection). The m cell strings arranged in the row direction are coupledto first to mth bit lines BL1 to BLm, respectively. In addition, q (q isa natural number) cell strings are arranged in a column direction (i.e.,a +Y direction). In FIG. 3, only two cell strings arranged in the columndirection are illustrated for convenience of description.

Each of the plurality of cell strings CS11 to CS1 m and CS21 to CS2 m isformed in a ‘U’ shape. Each of the plurality of cell strings CS11 to CS1m and CS21 to CS2 m includes a pipe transistor PT, memory cells MC1 toMCn, a source select transistor SST, and a drain select transistor DST,which are stacked above a substrate (not shown) at a lower portion ofthe memory block BLK1.

The select transistors SST and DST and the memory cells MC1 to MCn mayhave structures similar to one another. For example, each of the selecttransistors SST and DST and the memory cells MC1 to MCn may include achannel layer, a tunneling insulating layer, a charge storage layer, anda blocking insulating layer coupled to a corresponding row line.

The source select transistor SST of each cell string is coupled betweena common source line CSL and memory cells MC1 to MCp. The gate of thesource select transistor SST is commonly coupled to a source select lineSSL.

First to n-th memory cells MC1 to MCn of each cell string are coupledbetween the source select transistor SST and the drain select transistorDST.

The first to n-th memory cells MC1 to MCn are divided into first to p-thmemory cells MC1 to MCp and (p+1)-th to n-th memory cells MCp+1 to MCn.The first to p-th memory cells MC1 to MCp and the (p+1)-th to n-thmemory cells MCp+1 to MCn are coupled to each other through the pipetransistor PT. The first to p-th memory cells MC1 to MCp aresequentially arranged in the opposite direction of a +Z direction, andare coupled in series between the source select transistor SST and thepipe transistor PT. The (p+1)-th to n-th memory cells MCp+1 to MCn aresequentially arranged in the +Z direction, and are coupled in seriesbetween the pipe transistor PT and the drain select transistor DST. Thegates of the first to n-th memory cells MC1 to MCn are coupled to firstto n-th word lines WL1 to WLn, respectively.

The gate of the pipe transistor PT of each cell string is coupled to apipe line PL.

The drain select transistor DST of each cell string is coupled between acorresponding bit line and the memory cells MCp+1 to MCn. The drainselect transistors DST of cell strings CS11 to CS1 m of a first row arecoupled to a first drain select line DSL1. The drain select transistorsDST of cell strings CS21 to CS2 m of a second row are coupled to asecond drain select line DSL2.

Consequently, cell strings (e.g., CS11 to CS1 m) arranged on the samerow (i.e., in the +X direction) are coupled to the same drain selectline (e.g., DSL1) through corresponding drain select transistors. Cellstrings (e.g., CS11 and CS21) arranged on different rows are coupled todifferent drain select lines DSL1 and DSL2.

FIG. 4 is a circuit diagram illustrating another embodiment BLK1′ of theone BLK1 of the memory blocks BLK1 to BLKz of FIG. 2.

Referring to FIG. 4, a first memory block BLK1′ includes a plurality ofcell strings CS11′ to CS1 m′ and CS21′ to CS2 m′. In the first memoryblock BLK1′, m cell strings are arranged in a row direction (i.e., a +Xdirection). The m cell strings arranged in the row direction are coupledto first to m-th bit lines BL1 to BLm, respectively. In addition, q (qis a natural number) cell strings are arranged in a column direction(i.e., a +Y direction). In FIG. 4, only two cell strings arranged in thecolumn direction are illustrated for convenience of description.

Each of the plurality of cell strings CS11′ to CS1 m′ and CS21′ to CS2m′ extends along a +Z direction. Each of the plurality of cell stringsCS11′ to CS1 m′ and CS21′ to CS2 m′ includes a source select transistorSST, first to n-th memory cells MC1 to MCn, and a drain selecttransistor DST, which are stacked above a substrate (not shown) at alower portion of the memory block BLK1′.

The source select transistor SST of each cell string is commonly coupledto a common source line CSL. The source select transistor SST of eachcell string is coupled between the common source line CSL and the memorycells MC1 to MCn. The gate of the source select transistor SST of eachcell string is coupled to a source select line SSL.

The first to n-th memory cells MC1 to MCn of each cell string arecoupled in series between the source select transistor SST and the drainselect transistor DST. Memory cells arranged at the same height arecoupled to the same word line. The first to n-th memory cells MC1 to MCnare coupled to first to n-th word lines WL1 to WLn, respectively.

The drain select transistor DST of each cell string is coupled between acorresponding bit line and the memory cells MC1 to MCn. The drain selecttransistors of cell strings arranged on the same row (i.e., in the +Xdirection) are coupled to the same drain select line. The drain selecttransistors DST of cell strings CS11′ to CS1 m′ of a first row arecoupled to a first drain select line DSL1. The drain select transistorsDST of cell strings CS21′ to CS2 m′ of a second row are coupled to asecond drain select line DSL2.

Consequently, the memory block BLK1′ of FIG. 4 has an equivalent circuitsimilar to that of the memory block BLK1 of FIG. 3, except that the pipeselect transistor PT is excluded from each cell string.

In FIG. 4, first to m-th cell strings CS11′ to CS1 m′ or CS21′ to CS2 m′arranged in the row direction are coupled to the first to m-th bit linesBL1 to BLm, respectively. In another embodiment, even bit lines and oddbit lines may be provided instead of the first to m-th bit lines BL1 toBLm. In addition, it will be understood that, among the cell stringsCS11′ to CS1 m′ or CS21′ to CS2 m′ arranged in the row direction,even-numbered cell strings may be respectively coupled to the even bitlines and odd-numbered cell strings may be respectively coupled to theodd bit lines.

FIG. 5 is a block diagram illustrating any one of the page buffers ofFIG. 1.

FIG. 5 is a block diagram illustrating any one PB1 of the page buffersPB1 to PBm of FIG. 1. In FIG. 5, only a selected cell string CS11between the cell strings CS11 and CS21 coupled to the bit lines BL1 isillustrated for convenience of description. That is, it is assumed thatthe first drain select line DSL1 is selected and the second drain selectline DSL2 is not selected. Meanwhile, in FIG. 5, it is assumed that dataof an i-th memory cell MCi is read by the page buffer PB1. That is, in aread operation, a read pass voltage is applied to first to (i−1)-th wordlines WL1 to WLi−1 and (i+1)-th to n-th word lines WLi+1 to WLn, and aread voltage is applied to an i-th word line WLi.

Referring to FIG. 5, the page buffer PB1 includes a first current pathincluding a first transistor TR1, a second current path including secondand third transistors TR2 and TR3, fourth to sixth transistors TR4 toTR6, and a latch circuit LAT. In an embodiment, the first to sixthtransistors TR1 to TR6 may be NMOS transistors.

The first transistor TR1 is turned on as a first control signal CS1input to the gate terminal of the first transistor TR1 is activated, sothat the first current path can be formed between a common node S0 and afirst power source Va. In an embodiment, the first power source Va maybe a ground power source (0V). Through the first current path, the firstpower source Va may flow from the common node S0, and the firsttransistor TR1 emits a current from the common node S0 to the firstpower source Va. From such a viewpoint, the first transistor may bereferred to as an “emission transistor.” Further, the second transistorTR2 and the third transistor TR3 are turned on as a second controlsignal CS2 and a third control signal CS3, which are respectively inputto gate terminals of the second transistor TR2 and the third transistorTR3, are activated, so that the second current path can be formedbetween the common node S0 and a second power source Vb. In anembodiment, the second power source Vb may be a ground power source(0V). Further, when the third transistor TR3 is fully turned on, thepotential level of the common node S0 is transmitted to a sensing nodeSEN. From such a viewpoint, the third transistor TR3 may be referred toas a “transmission transistor.” In addition, when the second transistorTR2 is fully turned on, the second power source Vb is transmitted to thesecond current path. From such a viewpoint, the second transistor TR2may be referred to as a “power supply transistor.”

The fourth transistor TR4 is coupled between the bit line BL and thecommon node S0. According to an embodiment of the present disclosure,the common source line controller 130 of the semiconductor device 100may provide a channel voltage to the common source line CSL of the cellstring CS11 during a precharge period in the read operation. The channellevel of the cell string CS11 is increased, and the potential of the bitline BL1 is increased or maintained according to a program state of thei-th memory cell MCi. When a page buffer sensing signal PB_SENSE isfully activated, the fourth transistor TR4 transmits a voltage of thebit line BL1 to the common node S0. Further, the page buffer PB1 iscoupled to the bit line BL1 of the cell string CS11 through the fourthtransistor TR4. From such a viewpoint, the fourth transistor TR4 may bereferred to as a “bit line sensing transistor.”

The voltage of the sensing node SEN is applied to the gate terminal ofthe sixth transistor TR6. Therefore, the sixth transistor TR6 is turnedon or turned off according to the voltage of the sensing node SEN. Thevoltage of the sensing node SEN is determined according to the programstate of the i-th memory cell MCi. Therefore, the sixth transistor TR6is selectively turned on or turned off according to the program state ofthe i-th memory cell MCi. From such a viewpoint, the sixth transistorTR6 may be referred to as a “sensing transistor.”

The fifth transistor TR5 is coupled between the sixth transistor TR6 anda ground terminal. A strobe signal STB is input to the gate terminal ofthe fifth transistor TR5. If the strobe signal STB is activated, thefifth transistor TR5 is turned on, and the state of the latch circuitLAT is changed or maintained according to a turn-on or turn-off state ofthe sixth transistor TR6. The latch circuit LAT includes two invertersto latch data. The latch circuit LAT is coupled to the fifth transistorTR5. The latch circuit LAT stores corresponding data according towhether the fifth and sixth transistors TR5 and TR6 are turned on orturned off. In the embodiment of FIG. 5, a nod Q of the latch circuitLAT is initialized to a logic high state, and, accordingly, a node QS ofthe latch circuit LAT has a logic low state.

If the fifth transistor TR5 is turned on in a state in which the sixthtransistor TR6 is turned on, the node Q and the ground terminal areelectrically coupled to each other, and, accordingly, the state of thelatch circuit LAT is changed. More specifically, the node Q of the latchcircuit LAT is changed to the logic low state, and the node QS of thelatch circuit LAT is changed to the logic high state.

Although the fifth transistor TR5 is turned on in a state in which thesixth transistor TR6 is turned off, the node Q is not electricallycoupled to the ground terminal. Accordingly, the state of the latchcircuit LAT is not changed.

That is, whether the state of the latch circuit LAT is changed isdetermined according to a turn-on or turn-off state of the sixthtransistor TR6. Further, the state of the latch circuit LAT is changedor maintained at the time when the fifth transistor TR5 is turned on.From such a viewpoint, the fifth transistor TR5 may be referred to as a“strobe transistor.”

In the semiconductor device 100 according to the embodiment of thepresent disclosure, a bias having a positive value is applied to thecommon source line CSL such that the bit line BL1 is precharged in aread operation. Accordingly, in the structure of the memory cellstructure in which a selected cell string shares a source line with anadjacent cell string, the channel potential of an unselected cell stringis increased together, thereby preventing read disturbance. Further, thechannel potential of the selected cell string is partially increased, sothat the read disturbance can be prevented. In addition, the resistanceof a drain terminal is increased, so that a source line bouncingphenomenon can be prevented.

A more detailed operation of the page buffer PB1 shown in FIG. 5 will bedescribed later with reference to FIGS. 6 to 9.

FIG. 6 is a timing diagram illustrating an embodiment of an operation ofthe page buffer shown in FIG. 5 in a read operation.

Referring to FIG. 6, the bit line BL1 is precharged during a firstperiod T1. To this end, a channel current of the common source line toCSL is transmitted to the bit line BL1 according to a threshold voltageof a selected memory cell.

During the first period T1, a positive bias is applied to the commonsource line CSL. For example, a bias of 1.5V may be transmitted to thecommon source line CSL. Accordingly, the channel current can be providedto the cell string CS11.

A source select voltage is applied to the source select line SSL, and adrain select voltage is applied to the drain select line DSL1.Accordingly, the source select transistor SST and the drain selecttransistor DST are turned on. For example, each of the source selectvoltage and the drain select voltage may be 1.5V+Vth (Vth is a thresholdvoltage of a corresponding transistor). Accordingly, the drain selecttransistor DST coupled to the selected drain select line DSL1 cantransmit the channel current to the bit line BL1.

Meanwhile, the page buffer sensing voltage PB_SENSE is increased. Thepage buffer sensing voltage PB_SENSE is set to allow the fourthtransistor TR4 to be slightly turned on. The fact that the fourthtransistor TR4 is “slightly” turned on means that an effective voltageapplied to the gate terminal of the fourth transistor TR4 is in a rangelower than a certain reference voltage. The effective voltage has avalue obtained by subtracting a threshold voltage of a transistor from agate voltage. If the effective voltage increases, a channel depthincreases, and, therefore, a channel resistance decreases. Thus, whenthe effective voltage is in the range lower than the reference voltage,the channel resistance is maintained as a large value, so that nocurrent flows in spite of a source-drain voltage of the transistor (whenthe gate voltage is equal to the threshold voltage) or only a smallamount of current flows. The reference voltage may be determined asvarious values according to characteristics of the transistor. In anexemplary embodiment, the reference voltage with respect to the fourthtransistor TR4 may be 0.3V. In this case, the page buffer sensingvoltage PB_SENSE may be set to a voltage that is larger than “Vth” andis smaller than “0.3V+Vth.” For example, the page buffer sensing voltagePB_SENSE may be set to a value of 0.1V+Vth. Accordingly, during aprecharge period, no current flows through the fourth transistor TR4, oronly a small amount of current flows through the fourth transistor TR4.

The first control signal CS1 is not increased during the first periodT1, and, accordingly, the first transistor TR1 maintains the turn-offstate. Thus, no current flows in the first current path formed betweenthe common node S0 and the first power source Va during the prechargeperiod.

The second and third control signals CS2 and CS3 are increased. Thesecond and third control signals CS2 and CS3 are set to allow the secondand third transistors TR2 and TR3 to be fully turned on. The fact thatthe second and third transistors TR2 and TR3 are “fully” turned on meansthat an effective voltage applied to the gate terminals of the secondand third transistors TR2 and TR3 is in a range higher than a certainreference voltage. That is, since the effective voltage is in the rangehigher than the reference voltage, a channel resistance is maintained asa low value, so that a current fully flows when a source-drain voltageof a transistor is applied. For example, each of the second thirdcontrol signals CS2 and CS3 has 2.5V+Vth.

In this specification, a state in which a transistor is “fully” turnedon is referred to as a “first turn-on state,” and a state in which thetransistor is “slightly” turned on as compared with the state in whichthe transistor is “fully” turned on is referred to as a “second turn-onstate.” As described above, when the transistor is turned on in thefirst turn-on state, a current fully flows. When the transistor isturned on in the second turn-on state, no current flows or only a smallamount of current flows.

It is assumed first that a selected memory cell MCi has an erase state.That is, a threshold voltage of the selected memory cell MCi is lowerthan a read voltage applied to a selected word line WLi. In this case,as the selected memory cell MCi is turned on, the channel current of thecommon source line CSL may be transmitted to the bit line BL1 throughthe cell string CS11. At this time, the bit line BL1 has a specificvoltage. For example, a voltage V_BL of the bit line BL1 is 1.5V.

During the first period T1, the first transistor TR1 is in the turn-offstate, and the second and third transistors TR2 and TR3 are in theturn-on state, while the fourth transistor TR4 is slightly turned on inthe second turn-on state. Thus, a small amount of current flows throughthe bit line BL1, the fourth transistor TR4, the third transistor TR3,the second transistor TR2, and the second power source Vb. As the secondtransistor TR2 and the third transistor TR3 are turned on, a voltageV_SEN of the sensing node SEN and a voltage V_S0 of the common node S0maintain a state of 0V. In addition, a voltage difference between thevoltage (e.g., 1.5V) of the bit line BL1 and the second power source Vb(i.e., 0V) is mostly blocked by the fourth transistor TR4. Through theabove-described process, when the selected memory cell MCi is in theerase state, the bit line BL1 is precharged to a voltage value of 1.5V.

It is assumed this time that the selected memory cell MCi has a programstate. The threshold voltage of the selected memory cell MCi is higherthan the read voltage applied to the selected word line WLi. Theselected memory cell MCi is turned off, and the channel current providedto the common source line CSL may be blocked by the selected memory cellMCi. That is, the channel current of the common source line CSL is nottransmitted to the bit line BL1, and the voltage V_BL of the bit lineBL1 may maintain a low voltage value (e.g., 0V).

During a second period T2 of FIG. 6, the voltage of the common sourceline CSL is maintained as 1.5V, and the voltage of each of the drainselect line DSL1 and the source select line VSS is maintained as1.5V+Vth.

The buffer sensing signal PB_SENSE applied to the fourth transistor TR4is increased from 0.1V+Vth to 1.5V+Vth. Accordingly, the fourthtransistor TR4 is fully turned on in the first turn-on state, and thevoltage value V_S0 of the common node S0 is determined according to avoltage value of the bit line BL1. As described above, when the selectedmemory cell MCi has the erase state, the voltage V_BL of the bit lineBL1 is 1.5V in the first period T1. In this case, as the fourthtransistor TR4 is fully turned on, the voltage value V_S0 of the commonnode S0 also becomes 1.5V. When the selected memory cell MCi has theprogram state, the voltage V_BL of the bit line BL1 is 0V in the firstperiod T1. In this case, although the fourth transistor TR4 is turnedon, the voltage value V_S0 of the common node S0 may maintain 0V.Meanwhile, as the third transistor TR3 is turned on and the secondtransistor TR2 is turned off as will be described later, the voltagevalue V_S0 of the common node S0 is transmitted to the sensing node SEN.

The voltage value of the first control signal CS1 applied to the firsttransistor TR1 is increased to 0.1V+Vth. Accordingly, the firsttransistor TR1 that has been turned off during the first period T1 isslightly turned on in the second turn-on state, and no current flowsthrough the first transistor TR1 or only a small amount of current flowsthrough the first transistor TR1.

Meanwhile, the voltage value of the second control signal CS2 applied tothe second transistor TR2 is decreased to 0V. Accordingly, the secondtransistor TR2 is turned off, and electrical coupling between thesensing node SEN and the second power source Vb is interrupted.

The third control signal CS3 applied to the third transistor TR3 isdecreased at a point P1 of time in the second period T2. Thus, the thirdtransistor TR3 is turned off at the point P1 in time. Meanwhile, sincethe fourth transistor TR4 is turned off, the voltage V_BL of the bitline BL1 is transmitted to the common node S0. In addition, since thevoltage V_BL of the bit line BL1 is transmitted to the common node S0before the point P1 in time when the third transistor TR3 is turned off,the voltage V_S0 of the common node S0 is transmitted to the sensingnode SEN before the point P1 in time. Consequently, the voltage V_BL ofthe bit line BL1 is transmitted to the sensing node SEN via the commonnode S0. The third transistor TR3 is turned off after the voltage V_BLof the bit line BL1 is transmitted to the sensing node SEN via thecommon node S0. In FIG. 6, it is illustrated that the third controlsignal CS3 is decreased at the point P1 in time. However, this isillustrative, and the third control signal CS3 may be decreased afterthe point P1. For example, the third control signal CS3 may be decreasedat a point P2 in time or be decreased when the second period T2 isterminated. If the third control signal CS3 is decreased, the thirdtransistor TR3 is turned off, and, therefore, the sensing node SEN maybe floated.

The sixth transistor TR6 is turned on or turned off according to thevoltage value of the sensing node SEN. For example, when the selectedmemory cell MCi is in the erase state, the voltage V_SEN of the sensingnode SEN maintains 1.5V during the second period T2 as shown in FIG. 6,and thus the sixth transistor TR6 is turned on. When the selected memorycell MCi is in the program state, the voltage V_SEN maintains 0V duringthe second period T2 as shown in FIG. 6, and thus the sixth transistorTR6 is turned off.

After the voltage V_BL of the bit line BL1 is transmitted to the sensingnode SEN via the common node S0, the strobe signal STB is activated atthe point P2 of time, and thus the fifth transistor TR5 is turned on. Ifthe sixth transistor TR6 is in the turn-on state, the node Q of thelatch circuit LAT is electrically coupled to the ground power source. Asdescribed above, since the node Q of the latch circuit LAT isinitialized to the logic high state, a data value of the latch circuitLAT is changed in the above-described case. If the sixth transistor TR6is in the turn-off state, the node Q of the latch circuit LAT is notcoupled to the ground power source. In this case, the data value of thelatch circuit LAT is not changed.

Since the sixth transistor TR6 is turned on when the selected memorycell MCi is in the erase state, the data value of the latch circuit LATis changed when the selected memory cell MCi is in the erase state. Onthe other hand, since the sixth transistor TR6 is turned off when theselected memory cell MCi is in the program state, the data value of thelatch circuit LAT is not changed when the selected memory cell MCi is inthe program state.

As described above, in the semiconductor device 100 according to thepresent disclosure, the bit line BL1 is precharged by supplying acurrent to a channel region, so that data stored in the selected memorycell MCi can be transmitted to the latch circuit LAT.

FIG. 7 is a diagram illustrating a precharge operation of the pagebuffer according to the embodiment of FIG. 6 when the selected memorycell is in the erase state. Referring to FIGS. 6 and 7 both, anoperation during the first period T1 is illustrated in FIG. 7.

Since the selected memory cell MCi of the cell string CS11 is in theerase state, the bit line BL1 has a voltage of 1.5V when the voltage of1.5V is applied to the common source line CSL. The fourth transistor TR4is in the state in which it is slightly turned on, i.e., the secondturn-on state. Thus, a current slightly flows through the fourthtransistor TR4 or no current flows through the fourth transistor TR4.Since the first transistor TR1 is turned off, the current flowingthrough the fourth transistor TR4 flows toward the third transistor TR3,the second transistor TR2, and the second power source Vb. Since thesecond and third transistors TR2 and TR3 are fully turned on, thevoltage value of each of the common node S0 and the sensing node SENmaintains the voltage value of the second power source Vb, i.e., 0V.

That is, when the selected memory cell MCi is in the erase state, thebit line BL1 is precharged to a voltage value of 1.5V, and the voltagevalue of each of the common node S0 and the sensing node SEN maintains0V.

FIG. 8 is a diagram illustrating a sensing operation of the page bufferaccording to the embodiment of FIG. 6 when the selected memory cell isin the erase state.

After the precharge operation of FIG. 7, the voltage value of the pagesensing signal PB_SENSE is increased to 1.5V+Vth in the second periodT2. Accordingly, the fourth transistor TR4 is fully turned on, and thevoltage of the bit line BL1 is transmitted to the common node S0. As thesecond period T2 is started, the second transistor TR2 is turned off,and the electrical coupling between the sensing node SEN and the secondpower source Vb is interrupted. Meanwhile, the third transistor TR3maintains the turn-on state during a certain time after the secondperiod T2 is started, and then turned off at the point P1 in time. Thus,the voltage of the common node S0 is transmitted to the sensing node SENwhile the third transistor TR3 is maintaining the turn-on state beforethe point P1. If the third transistor TR3 is turned off at the point P1,the sensing node SEN is floated to maintain a current voltage. That is,when the selected memory cell MCi is in the erase state, 1.5V istransmitted to the sensing node SEN, and maintains the correspondingvoltage value even after the point P1.

The third transistor TR3 is turned off after the point P1. The firsttransistor TR1 is slightly turned on in the second turn-on state. Thus,as shown in FIG. 8, a current slightly flows toward the first powersource Va through the first transistor TR1 from the common node S0, orno current flows. Meanwhile, the fifth transistor TR5 is turned on atthe point P2 in time. Since the sixth transistor TR6 is in the turn-onstate, a current path is formed between the node Q of the latch circuitLAT and the ground. Accordingly, the voltage value of the node Q, whichwas initially in the logic high state, is decreased to be changed to thelogic low state. Consequently, data stored in the latch circuit LAT ischanged. In summary, with reference to FIGS. 7 and 8, when the selectedmemory cell MCi is in the erase state, the voltage of the bit line BL1is increased during the first period T1. Accordingly, as the sixthtransistor TR6 is turned on in the second period T2, the data stored inthe latch circuit LAT is changed by the strobe signal STB.

FIG. 9 is a diagram illustrating an operation of the page bufferaccording to the embodiment of FIG. 6 when the selected memory cell isin the program state.

As described above, when the selected memory cell MCi is in the programstate, no current flows toward the bit line BL1 even when a positivevoltage (1.5V) is applied to the common source line CSL. Accordingly,the voltage of the bit line BL1 is not increased but maintains a voltagevalue of 0V. After that, the sixth transistor TR6 is not turned on inthe second period T2, and, accordingly, the data stored in the latchcircuit LAT is not changed even when the strobe signal STB is activated.

FIG. 10 is a timing diagram illustrating another embodiment of theoperation of the page buffer shown in FIG. 5 in the read operation. FIG.11 is a diagram illustrating a read operation of the page bufferaccording to the embodiment of FIG. 10 when the selected memory cell isin the erase state. Hereinafter, the operations will be described withreference to FIGS. 10 and 11.

Referring to FIG. 10, unlike FIG. 6, a period is not divided. During aperiod T3, a positive voltage value is provided to the common sourceline CSL, and a voltage of 1.5V+Vth is supplied to the drain select lineDSL1 and the source select line SSL, while the page buffer sensingsignal PB_SENSE is also maintained as the voltage value of 1.5V+Vth.Thus, the drain select transistor DST, the source select transistor SST,and the fourth transistor TR4 are fully turned on. Accordingly, when theselected memory cell MCi is in the erase state, the bit line BL1 isprecharged to 1.5V as shown in FIG. 11, and the voltage V_BL of the bitline BL1 is transmitted to the common node S0.

The first control signal CS1 has a voltage value of 0.1V+Vth during theperiod T3. Accordingly, the first transistor TR1 is slightly turned onin the second turn-on state. Meanwhile, since the second control signalCS2 maintains a voltage value of 0V, the second transistor TR2 is turnedon, and the electrical coupling between the sensing node SEN and thesecond power source Vb is interrupted.

The third control signal CS3 maintains a voltage value of 2.5V+Vth untilbefore a point P3 in time in the period T3. Thus, the third transistorTR3 is fully turned on to transmit the voltage value V_S0 of the commonnode S0 to the sensing node SEN. When the selected memory cell MCi is inthe erase state as shown in FIG. 11, a voltage value of 1.5V istransmitted to the sensing node SEN, and, accordingly, the sixthtransistor TR6 maintains the turn-on state. In this state, although thethird transistor TR3 is turned off at the point P3 in time, the sensingnode SEN is floated to maintain the voltage value of 1.5V. Accordingly,the sixth transistor TR6 also maintains the turn-on state.

As the strobe signal STB is activated at a point P4 in time, the fifthtransistor TR5 is turned on. When the selected memory cell MCi to is inthe erase state as shown in FIG. 11, the sixth transistor TR6 is in theturn-on state, and thus a current path is formed between the node Q ofthe latch circuit LAT and the ground. Accordingly, the voltage value ofthe node Q, which was initially in the logic high state, is decreased tobe changed to the logic low state. Consequently, data stored in thelatch circuit LAT is changed.

If the selected memory cell MCi is in the program state, the sixthtransistor TR6 may be in the turn-off state at the point P4 of time.Therefore, in this case, no current path is formed between the node Q ofthe latch circuit LAT and the ground. Accordingly, the voltage value ofthe node Q, which was initially in the logic high state, is maintained,and the data stored in the latch circuit LAT is not changed.

As described above, in the semiconductor device 100 according to theembodiment of the present disclosure, a bias having a positive value isapplied to the common source line CSL such that the bit line BL1 isprecharged in a read operation. Accordingly, in the structure of thememory cell structure in which a selected cell string shares a sourceline with an adjacent cell string, the channel potential of anunselected cell string is increased together, thereby preventing readdisturbance. Further, the channel potential of the selected cell stringis partially increased, so that the read disturbance can be prevented.In addition, the resistance of a drain terminal is increased, so that asource line bouncing phenomenon can be prevented.

FIG. 12 is a flowchart illustrating an operating method of thesemiconductor device according to an embodiment of the presentdisclosure.

Referring to FIG. 12, the operating method of the semiconductor deviceaccording to the embodiment of the present disclosure includes step S110of precharging a bit line according to a program state of a selectedmemory cell of a cell string by providing a channel voltage to a commonsource line, step S130 of transmitting a voltage of the precharged bitline to a sensing node coupled to a gate electrode of a sensingtransistor, and step S150 of storing data of the selected memory cell ina latch circuit, based on the voltage transmitted to the sensing node. Adetailed description of each step will be described later with referenceto FIGS. 13 to 15.

FIG. 13 is a flowchart illustrating an embodiment of the step ofprecharging the bit line, which is shown in FIG. 12.

Referring to FIG. 13, the step S110 of FIG. 12 includes step S210 ofapplying a channel voltage having a positive voltage value (e.g., 1.5V)to the common source line CSL coupled to the cell string CS11 and stepS230 of turning on the drain select transistor DST and the source selecttransistor SST of the cell string CS11.

As shown in FIG. 6, a channel voltage having a voltage value of 1.5V isapplied to the common source line CSL in the period T1 (S210). Inaddition, signals having a voltage value of 1.5+Vth are applied to thedrain select line DSL1 and the source select line SSL in the period T1(S210).

Alternatively, as shown in FIG. 10, a channel voltage having a voltagevalue of 1.5V is applied to the common source line CSL in the period T3(S210). In addition, signals having a voltage value of 1.5+Vth areapplied to the drain select line DSL1 and the source select line SSL inthe period T3 (S210).

As shown in FIG. 7 or 11, the bit line BL1 is precharged through thesteps S210 and S230 (S110).

FIG. 14 is a flowchart illustrating an embodiment of the step oftransmitting the voltage of the bit line to the sensing node, which isshown in FIG. 12.

Referring to FIG. 14, the step S130 of FIG. 12 includes step S310 ofturning off the power supply transistor, e.g., the second transistor TR2coupled between the sensing node SEN and a terminal of an external powersource (e.g., the second power source Vb) and step S330 of increasing avoltage value (e.g., a voltage value of the page buffer sensing signalPB_SENSE) applied to the gate terminal of the bit line sensingtransistor, e.g., the fourth transistor TR4 coupled between the bit lineBL1 and the common node S0.

As shown in FIG. 6, the voltage value of the second control signal CS2is decreased in the period T2, so that the second transistor TR2 isturned off (S310). Accordingly, the electrical coupling between thesecond power source Vb and the sensing node SEN is interrupted. Inaddition, the voltage value of the page buffer sensing signal PB_SENSEis increased from 0.1V+Vth to 1.5V+Vth in the period T2 (S330).Accordingly, the fourth transistor TR4 is turned on, so that the voltageV_BL of the bit line BL1 is transmitted to the common node S0.

FIG. 15 is a flowchart illustrating an embodiment of the step of storingthe data of the selected memory cell in the latch circuit, which isshown in FIG. 12.

Referring to FIG. 15, the step S150 of FIG. 12 includes step S410 ofturning off the transmission transistor, i.e., the third transistor TR3coupled between the sensing node SEN and the common node S0 and stepS430 of turning on the strobe transistor, i.e., the fifth transistor TR5coupled between the sensing transistor having the gate electrode coupledto the sensing node SEN, i.e. a first electrode of the sixth transistorT6 and the ground terminal.

As shown in FIG. 6, the voltage of the third control signal CS3 isdecreased at the point P1 in time in the period T2. Accordingly, thethird transistor TR3 is turned off (S410), and the sensing node SEN isfloated. In addition, as the strobe signal STB is activated at the pointP2 in time in the period T2, the fifth transistor TR5 is turned on(S430), and the data stored in the latch circuit LAT is changed ormaintained according to the program state of the selected memory cellMCi.

FIG. 16 is a block diagram illustrating another embodiment of the memorycell array of FIG. 1.

The spirit of the present disclosure may be applied even when memorycells are two-dimensionally arranged. Referring to FIG. 16, the memorycell array 110 includes a plurality of planar memory blocks to PBLK1 toPBLKz. Each of the plurality of planar memory blocks PBLK1 to PBLKzincludes first to m-th cell strings CS1 to CSm. The first to m-th cellstrings CS1 to CSm are coupled to first to m-th bit lines BL1 to BLm,respectively.

Each of the plurality of cell strings CS1 to CSm includes a sourceselect transistor SST, a plurality of memory cells M1 to Mn coupled inseries, and a drain select transistor DST. The source select transistorSST is coupled to a source select line SSL. First to n-th memory cellsM1 to Mn are coupled to first to n-th word lines WL1 to WLn,respectively. The drain select transistor DST is coupled to a drainselect line DSL. A source side of the source select transistor SST iscoupled to a common source line CSL. A drain side of the drain selecttransistor DST is coupled to a corresponding bit line. The source selectline SSL, the first to n-th word lines WL1 to WLn, and the drain selectline DSL are included in the row lines RL of FIG. 1. The source selectline SSL, the first to n-th word lines WL1 to WLn, and the drain selectline DSL are driven by the address decoder 120. The common source lineCSL is driven by the common source line controller 130.

In an embodiment, the memory cells are volatile or nonvolatile memorycells.

FIG. 17 is a block diagram illustrating a memory system 1000 includingthe semiconductor device 100 of FIG. 1.

Referring to FIG. 17, the memory system 1000 includes a semiconductordevice 100 and the controller 1100.

The semiconductor device 100 may be configured and operated as describedwith reference to FIGS. 1 to 16. Hereinafter, overlapping descriptionswill be omitted.

The controller 1200 is coupled to a host Host and the semiconductordevice 100. The controller 1200 is configured to access thesemiconductor device 100 in response to a request from the host Host.For example, the controller 1200 is configured to control read, write,erase, and background operations of the semiconductor device 100. Thecontroller 1200 is configured to provide an interface between thesemiconductor device 100 and the host Host. The controller 1200 isconfigured to drive firmware for controlling the semiconductor device100.

The controller 1200 includes a random access memory (RAM) 1210, aprocessing unit 1220, a host interface 1230, a memory interface 1240,and an error correction block 1250. The RAM 1210 is used as at least oneof an operation memory of the processing unit 1220, a cache memorybetween the semiconductor device 100 and the host Host, and a buffermemory between the semiconductor device 100 and the host Host. Theprocessing unit 1220 controls overall operations of the controller 1200.

The host interface 1230 includes a protocol for exchanging data betweenthe host Host and the controller 1200. As an embodiment, the controller1200 is configured to communicate with the host Host through at leastone of various interface protocols such as a universal serial bus (USB)protocol, a multimedia card (MMC) protocol, a peripheral componentinterconnection (PCI) protocol, a PCI-express (PCI-E) protocol, anadvanced technology attachment (ATA) protocol, a serial-ATA protocol, aparallel-ATA protocol, a small computer small interface (SCSI) protocol,an enhanced small disk interface (ESDI) protocol, an integrated driveelectronics (IDE) protocol, and a private protocol.

The memory interface 1240 interfaces with the semiconductor device 100.For example, the memory interface 1240 may include a NAND interface or aNOR interface.

The error correction block 1250 is configured to detect and correct anerror of data received from the semiconductor device 100 by using anerror correction code (ECC).

The controller 1200 and the semiconductor device 100 may be integratedinto one semiconductor device. In an exemplary embodiment, thecontroller 1200 and the semiconductor device 100 may be integrated intoone semiconductor device, to constitute a memory card. For example, thecontroller 1200 and the semiconductor device 100 may be integrated intoone semiconductor device, to constitute a memory card such as a PC card(personal computer memory card international association (PCMCIA)), acompact flash (CF) card, a smart media card (SM or SMC), a memory stick,a multimedia card (MMC, RS-MMC or MMCmicro), an SD card (SD, miniSD,microSD or SDHC), or a universal flash storage (UFS).

The controller 1200 and the semiconductor device 100 may be integratedinto one semiconductor device to constitute a semiconductor drive (solidstate drive (SSD)). The semiconductor drive SSD includes a storagedevice configured to store data in a semiconductor memory. If the memorysystem 1000 is used as the semiconductor drive SSD, the operating speedof the host Host coupled to the memory system 1000 can be remarkablyimproved.

As another example, the memory system 1000 may be provided as one ofvarious components of an electronic device such as a computer, a ultramobile PC (UMPC), a workstation, a net-book, a personal digitalassistant (PDA), a portable computer, a web tablet, a wireless phone, amobile phone, a smart phone, an e-book, a portable multimedia player(PMP), a portable game console, a navigation system, a black box, adigital camera, a 3-dimensional television, a digital audio recorder, adigital audio player, a digital picture recorder, a digital pictureplayer, a digital video recorder, a digital video player, a devicecapable of transmitting/receiving information in a wireless environment,one of various electronic devices that constitute a home network, one ofvarious electronic devices that constitute a computer network, one ofvarious electronic devices that constitute a telemetics network, an RFIDdevice, or one of various components that constitute a computing system.

In an exemplary embodiment, the semiconductor device 100 or the memorysystem 1000 may be packaged in various forms. For example, thesemiconductor device 100 or the memory system 1000 may be packaged in amanner such as package on package (PoP), ball grid arrays (BGAs), chipscale packages (CSPs), plastic leaded chip carrier to (PLCC), plasticdual in-line package (PDIP), die in Waffle pack, die in wafer form, chipon board (COB), ceramic dual in-line package (CERDIP), plastic metricquad flat pack (MQFP), thin quad flat pack (TQFP), small outlineintegrated circuit (SOIC), shrink small out line package (SSOP), thinsmall outline package (TSOP), thin quad flat pack (TQFP), system inpackage (SIP), multi chip package (MCP), wafer-level fabricated package(WFP), or wafer-level processed stack package (WSP).

FIG. 18 is a block diagram illustrating an exemplary application 2000 ofthe memory system 1000 of FIG. 17.

Referring to FIG. 18, the memory system 2000 includes a semiconductordevice 2100 and a controller 2200. The semiconductor device 2100includes a plurality of semiconductor memory chips. The plurality ofsemiconductor memory chips are divided into a plurality of groups.

In FIG. 18, it is illustrated that the plurality of groups communicatewith the controller 2200 through first to kth channels CH1 to CHk. Eachsemiconductor memory chip may be configured and operated identically tothe semiconductor device 100 described with reference to FIG. 1.

Each group is configured to communicate with the controller 2200 throughone common channel. The controller 2200 is configured similarly to thecontroller 1200 described with reference to FIG. 17. The controller 2200is configured to control the plurality of memory chips of thesemiconductor device 2100 through the plurality of channels CH1 to toCHk.

In FIG. 18, it has been illustrated that a plurality of semiconductormemory chips are coupled to one channel. However, it will be understoodthat the memory system 2000 may be modified such that one semiconductormemory chip is coupled to one channel.

FIG. 19 is a block diagram illustrating a computing system 3000including the memory system 2000 described with reference to FIG. 18.

Referring to FIG. 19, the computing system 3000 includes a centralprocessing unit 3100, a RAM 3200, a user interface 3300, a power source3400, a system bus 3500, and the memory system 2000.

The memory system 2000 is electrically coupled to the central processingunit 3100, the RAM 3200, the user interface 3300, and the power source3400 through the system bus 3500. Data supplied through user interface3300 or data processed by the central processing unit 3100 are stored inthe memory system 2000.

In FIG. 19, it is illustrated that the semiconductor device 2100 iscoupled to the system bus 3500 through the controller 2200. However, thesemiconductor device 2100 may be directly coupled to the system bus3500. In this case, the function of the controller 2200 may be performedby the central processing unit 3100 and the RAM 3200.

In FIG. 19, it is illustrated that the memory system 2000 described withreference to FIG. 18 is provided. However, the memory system 2000 may bereplaced by the memory system 1000 described with reference to FIG. 17.In an embodiment, the computing system 3000 may be configured to includeboth the memory systems 1000 and 2000 described with reference to FIGS.17 and 18.

According to the present disclosure, it is possible to provide asemiconductor device having improved reliability of a read operation.

Further, according to the present disclosure, it is possible to providea read method of a semiconductor device having improved reliability.

Example embodiments have been disclosed herein, and although specificterms are employed, they are used and are to be interpreted in a genericand descriptive sense only and not for purpose of limitation. In someinstances, as would be apparent to one of ordinary skill in the art asof the filing of the present application, features, characteristics,and/or elements described in connection with a particular embodiment maybe used singly or in combination with features, characteristics, and/orelements described in connection with other embodiments unless otherwisespecifically indicated. Accordingly, it will be understood by those ofskill in the art that various changes in form and details may be madewithout departing from the spirit and scope of the present disclosure asset forth in the following claims.

What is claimed is:
 1. A semiconductor device comprising: a cell stringincluding a plurality of memory cells coupled in series between a commonsource line and a bit line; a common source line controller configuredto provide a channel current to the cell string through the commonsource line in a read operation; and a page buffer configured to sensedata stored in a selected memory cell among the plurality of memorycells based on a current of the bit line when the channel current isprovided, wherein the common source line controller precharges the bitline with the channel current supplied to the cell string through thecommon source line, wherein, after the bit line is precharged, the pagebuffer senses the data stored in the selected memory cell based on avoltage of the bit line transmitted to a sensing node.
 2. Thesemiconductor device of claim 1, wherein the buffer page includes: a bitline sensing transistor coupled between the bit line and a common node;an emission transistor coupled between the common node and a first powersource; a transmission transistor coupled between the common node andthe sensing node; and a power supply transistor coupled between thesensing node and a second power source, wherein, while the bit line isbeing precharged, the transmission transistor and the power supplytransistor are turned on in a first turn-on state, the bit line sensingtransistor is turned on in a second turn-on state, and the emissiontransistor is turned off.
 3. The semiconductor device of claim 2,wherein, while the bit line is being precharged, the second power sourcesupplies a ground voltage, and the potential of each of the common nodeand the sensing node is 0V.
 4. The semiconductor device of claim 3,wherein, after the bit line is precharged, the emission transistor isturned on in the second turn-on state, the power supply transistor isturned off, and the transmission transistor maintains the first turn-onstate.
 5. The semiconductor device of claim 4, wherein, as thetransmission transistor is turned on in the first turn-on state, avoltage of the common node is transmitted to the sensing node.
 6. Thesemiconductor device of claim 5, wherein the page buffer furtherincludes: a sensing transistor having a gate electrode coupled to thesensing node; a strobe transistor coupled between a first electrode ofthe sensing transistor and a third power source; and a latch circuitcoupled to a second electrode of the sensing transistor.
 7. Thesemiconductor device of claim 6, wherein the strobe transistor is anNMOS transistor, and the third power source is a ground power source. 8.The semiconductor device of claim 6, wherein, in the state in which thevoltage of the common node is transmitted to the sensing node, thestrobe transistor is turned on in the first turn-on state.
 9. Thesemiconductor device of claim 8, wherein, as the strobe transistor isturned on in the first turn-on state, the data stored in the selectedmemory cell is transmitted to the latch circuit.
 10. The semiconductordevice of claim 8, wherein, after the voltage of the common node istransmitted to the sensing node, the transmission transistor is turnedoff.
 11. A method for operating a semiconductor device, the methodcomprising: precharging a bit line according to a program state of aselected memory cell of a cell string by providing a channel voltage toa common source line; transmitting a voltage of the precharged bit lineto a sensing node coupled to a gate electrode of a sensing transistor;and storing data of the selected memory cell in a latch circuit, basedon the voltage transmitted to the sensing node.
 12. The method of claim11, wherein the precharging of the bit line includes: applying a channelvoltage having a positive voltage value to the common source line of thecell string; and turning on a drain select transistor and a sourceselect transistor of the cell string in a first turn-on state.
 13. Themethod of claim 12, wherein the transmitting of the voltage of theprecharged bit line to the sensing node coupled to the gate electrode ofthe sensing transistor includes: turning off a power supply transistorcoupled between the sensing node and a terminal of an external powersource; and increasing a voltage value applied to a gate terminal of abit line sensing transistor coupled between the bit line and a commonnode.
 14. The method of claim 13, wherein the storing of the data of theselected memory cell in the latch circuit, based on the voltagetransmitted to the sensing node, includes: turning off a transmissiontransistor coupled between the sensing node and the common node; andturning on a strobe transistor coupled between a first electrode of thesensing transistor having the gate electrode coupled to the sensing nodeand a ground terminal in the first turn-on state.
 15. The method ofclaim 14, wherein, as the strobe transistor is turned on in the firstturn-on state, the data stored in the selected memory cell istransmitted to the latch circuit coupled to a second electrode of thesensing transistor.
 16. A method for operating a semiconductor device,the method comprising: providing a channel voltage to a common sourceline; transmitting a voltage of a bit line according to a program stateof a selected memory cell of a cell string to a sensing node coupled toa gate electrode of a sensing transistor, based on the provided channelvoltage; and storing data of the selected memory cell in a latchcircuit, based on the voltage transmitted to the sensing node.
 17. Themethod of claim 16, wherein, in the providing of the channel voltage tothe common source line, the channel voltage having a positive voltagevalue is applied to the common source line of the cell string.
 18. Themethod of claim 17, wherein the transmitting the voltage of the bit lineto the sensing node coupled to the gate electrode of the sensingtransistor includes increasing a voltage value applied to a gateterminal of a bit line sensing transistor coupled between the bit lineand a common node.
 19. The method of claim 18, wherein the storing ofthe data of the selected memory cell in the latch circuit, based on thevoltage transmitted to the sensing node, includes: turning off atransmission transistor coupled between the sensing node and the commonnode; and turning on a strobe transistor coupled between a firstelectrode of the sensing transistor having the gate electrode coupled tothe sensing node and a ground terminal in a first turn-on state.
 20. Themethod of claim 19, wherein, as the strobe transistor is turned on inthe first turn-on state, the data stored in the selected memory cell istransmitted to the latch circuit coupled to a second electrode of thesensing transistor.